Electron Mobility Estimate in GaN MOSFETs

Authors

  • Ravi Kumar Chanana Self-Employed Independent Researcher, Gr. Noida-201310, India

DOI:

https://doi.org/10.63002/asrp.210.745

Keywords:

Gallium Nitride, MOS device, Carrier Mobility

Abstract

In this research article, estimation of electron mobility is made in GaN n-channel MOSFETs.  The technology for GaN MOSFETs is at an infant stage and an early prediction enables technology development.  The electron mobility in a Si (100) n-channel MOSFET is also made that vouches for the simple formula developed for the electron mobility estimation, though the long-channel Si MOSFET technology is now of the past.     

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Published

24-12-2024